Our selenium deposition equipment enables safe, efficient and cost-effective CIGS cell production using vapor transport deposition (VTD) in an inert, atmospheric-pressure environment. Thanks to highly accurate temperature control, it ensures a uniform temperature distribution across the substrate in the deposition area. Together with the laminar flow injector design, this guarantees a homogeneous selenium layer. Load locks at the entrance and exit of the deposition chamber prevent the release of process gases without the need for gas curtains. This both maximizes safety and reduces the overall cost of operation. It also maintains low contamination levels for higher module efficiency.