Emissions Monitoring for Chemical Plants - Aerospace & Air Transport

The Opsis gas monitoring system is designed for monitoring in stacks and gas ducts in chemical industries, both in order to increase plant efficiency and to monitor emissions. The Opsis systems have been internationally approved by e.g. the German TÜV and the U.S. EPA.

Gaseous Parameters

Unaffected by the gases, temperatures and particulates, the Opsis system continuously monitors several compounds, such as

  • NOx
  • Carbon dioxide (CO2)
  • Sulphur dioxide (SO2)
  • Water vapour (H2O)
  • Phenol
  • Formaldehyde
  • Mercury (Hg)
  • Styrene and other hydrocarbons
  • Chlorine
  • Chlorine dioxide
  • Ozone
  • Carbon disulphide

Why Opsis?

  • High-performance, in situ monitoring
  • Multi-gas and multi-path system
  • Combines the benefits of both UV, IR and TDL technology
  • Withstands aggressive environment with high levels of particulates and gases
  • No sample required
  • Operates with a minimum of maintenance
  • Easily calibrated
  • Serviced by highly skilled service network
  • Internationally approved

Software

Opsis offers complete software packages for data handling, such as data acquisition, validation and reporting. The software meets the EC regulation for reporting.