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ftir monitoring system manufacturer Applications

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    Gas monitoring instruments and systems for semiconductor manufacturing

    In the semiconductor manufacturing industry, various perfluorinated compounds (PFCs) are used. The emissions of the PFC compounds into the ambient air are reduced by scrubbing of the exhaust gases from the process. In this process, the Gasmet™ FTIR Gas Analyzers can be used to measure the emissions into the atmosphere and also monitor the efficiency of the scrubbers. Typically monitored PFCs in the exhaust gas include carbon tetrafluoride CF4, trifluoromethane CHF3, and hexafluoroethane C2F6.

    By Gasmet Technologies Oy based in Helsinki, FINLAND.

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    Measurement solution for CFC abatement control via two stream FTIR system

    CFC usage in industry

    Although the use of CFCs in domestic products has been widely phased out, CFCs chemicals still prove a vital ingredient in the production of insecticides and herbicides. Such products aim to increase the rate of crop production all over the world. All aspects of such a manufacturing process in relation to environmental impact must be well controlled. The use and pre-emission removal of CFCs in the intermediary steps of the insecticide production needs to be monitored with 100% efficiency.

    By Protea Limited based in Middlewich, UNITED KINGDOM.

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    Gas monitoring instruments and systems for phosgene monitoring

    Phosgene COCl2 is a colorless gas. While it has been used as a Chemical Weapon Agent (CWA) in the past, currently this poisonous gas is also an important reagent in synthesis in the pharmaceutical and chemical industries. The plants using phosgene are typically equipped with gas sensors to detect leaks in the indoor ambient air. The critical situations arise when equipment in contact with the gas at the manufacturing facilities are serviced and maintained. As phosgene is very poisonous, even small gas pockets in serviced equipment may be dangerous to maintenance personnel. Gasmet™ FTIR Gas Analyzers are ideal tools to monitor point sources of phosgene. The measurement technology has high specificity, may be operated continuously, and has a fast response time.

    By Gasmet Technologies Oy based in Helsinki, FINLAND.

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    Gas monitoring instruments and systems for process NOx measurement

    Nitric acid HNO3 is an important intermediate reagent for production of several important end products, such as fertilizers, explosives, dyestuffs/pigments, pesticides, pharmaceuticals, photographic materials, plastics, and synthetic fibers. At nitric acid manufacturing plants, the Gasmet™ FTIR Gas Analyzer can be used to measure several gaseous components from the process stream for purposes of process control. A single system can be used to measure the high levels of nitrogen monoxide NO and nitrogen dioxide NO2, as well as water vapor H2O, nitrous oxide N2O, carbon monoxide CO, carbon dioxide CO2 and ammonia NH3. The fixed installation products for these purposes are the Gasmet™ CEM II measurement system, and the Gasmet™ FCX Gas Analyzers, both of which utilize the FTIR measurement technique for simultaneous multicomponent analysis of the sample gas.

    By Gasmet Technologies Oy based in Helsinki, FINLAND.

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