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inductively coupled plasma Applications

  • Plasma Characterisation

    Hiden plasma probes measure some of the key plasma parameters and provide detailed information relating to plasma reaction chemistry. Plasma diagnostics for applications in etching, deposition, coating and surface modification. ECR – Electron Cyclotron Resonance plasma Magnetron sputtering High power impulse magnetron sputtering, HIPIMS ICP inductively coupled plasma, and RF plasma Dielectric-barrier discharge (DBD)

    By Hiden Analytical based in Warrington, UNITED KINGDOM.

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    Analytical instruments for atomic spectroscopy

    Besides Mass Spectrometry, a further variety of analysis techniques are categorized as atomic spectroscopy. Analysis techniques which use inductively coupled plasma (ICP), such as ICP-OES and ICP-MS, are among these. With increasing environmental awareness backed by regulations, an increasingly important use of atomic spectroscopy techniques is in mercury analysis. Achieving a high mass flow control performance, e.g. high repeatability or an excellent turn-down ratio, is a prerequisite to achieve a high analyzer performance. For this, a number of Axetris customers rely on our products while designing such systems.

    By Axetris Ag based in Kaegiswil, SWITZERLAND.

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