Monitors, gas analyzers solutions for semiconductor / microelectronics sector - Electronics and Computers
Particle Measuring Systems (PMS) has the application expertise and particle monitoring instruments with the industry leading sensitivity you need to reduce yield loss. Particle Measuring Systems PMS can provide you with particle monitoring solutions to determine how clean your semiconductor or microelectronics manufacturing is. By continuously counting particles when and where products (water, chemicals, air) are at risk, we provide the global expertise and high-performance laser particle counters you count on.
Overview Applications & industries Served
Particle Measuring Systems PMS is the only company to reliably provide you with the highest particle counting sensitivity for chemicals, DI water, and airborne applications:
Our complete particle monitoring solutions provide you with the software, knowledge and quality service for seamless application
Particle Monitoring for Chemicals
Process chemicals are used in many steps to fabricate semiconductor and other critical products, and their purity is critical to maximize product yields and performance. Particle monitoring in process chemicals, from the chemical manufacturing point to the final use-point of the product, is extremely important in today’s clean processes. The use of on-line continuous particle monitoring enables process or facility engineers to respond rapidly to changes in chemical purity levels throughout the chemical distribution process. Our chemical batch sampling particle monitoring solutions have the versatility for a variety of applications and unmatched sensitivity at 20 nm.
Process chemicals are used in many steps to fabricate semiconductor and other critical products, and their purity is critical to maximize product yields and performance. Particle monitoring in process chemicals, from the chemical manufacturing point to the final use-point of the product, is extremely important in today’s clean processes. The use of on-line continuous particle monitoring enables process or facility engineers to respond rapidly to changes in chemical purity levels throughout the chemical distribution process. Our chemical batch sampling particle monitoring solutions have the versatility for a variety of applications and unmatched sensitivity at 20 nm.
Particle Monitoring for Ultra-Pure Water
Many precision manufacturing processes use ultra-pure water (UPW) / DI Water for critical cleaning and rinsing steps. For advanced semiconductor processing, UPW processes must maintain very low particle concentration levels, measured at the 20 nm level. UPW is also commonly used for chemical dilution and flushing steps within chemical blending and distribution systems. The use of continuous online particle counters, either at the final water purification step or at the wafer point-of-use, provides UPW facility and fab process engineers the critical particle data needed to effectively manage the water purification and wafer cleaning processes.
Many precision manufacturing processes use ultra-pure water (UPW) / DI Water for critical cleaning and rinsing steps. For advanced semiconductor processing, UPW processes must maintain very low particle concentration levels, measured at the 20 nm level. UPW is also commonly used for chemical dilution and flushing steps within chemical blending and distribution systems. The use of continuous online particle counters, either at the final water purification step or at the wafer point-of-use, provides UPW facility and fab process engineers the critical particle data needed to effectively manage the water purification and wafer cleaning processes.
Particle Counters for Gases
Sophisticated technology manufacturing relies on ultra-high purity gases in order to produce leading edge semiconductors, LED/OLED displays, disk drives, and precision optics with high yields. These gases are ultimately supplied directly to process tools to purge and protect the product, or to contribute to process reactions which positively transform the product. However, when poor quality gas is delivered, yields decrease due to a contribution of point defects, reduced thin film adhesion, and electrical property changes due to ionic contaminants. To ensure gas quality meets particle specifications, monitoring is implemented at the gas source and within Continuous Quality Control (CQC) systems. Laser particle counters combined with high pressure diffusers are used to check and troubleshoot gas quality in the downstream distribution piping or as a validation test of gas component cleanliness. An effective strategy combines continuous and periodic monitoring throughout the gas flow path to ensure the highest purity gas is delivered to the final point of use.
Sophisticated technology manufacturing relies on ultra-high purity gases in order to produce leading edge semiconductors, LED/OLED displays, disk drives, and precision optics with high yields. These gases are ultimately supplied directly to process tools to purge and protect the product, or to contribute to process reactions which positively transform the product. However, when poor quality gas is delivered, yields decrease due to a contribution of point defects, reduced thin film adhesion, and electrical property changes due to ionic contaminants. To ensure gas quality meets particle specifications, monitoring is implemented at the gas source and within Continuous Quality Control (CQC) systems. Laser particle counters combined with high pressure diffusers are used to check and troubleshoot gas quality in the downstream distribution piping or as a validation test of gas component cleanliness. An effective strategy combines continuous and periodic monitoring throughout the gas flow path to ensure the highest purity gas is delivered to the final point of use.
Particle Counters for Air
Cleanrooms are controlled environments where product manufacturing quality can be impacted by particulate contamination. These cleanrooms use active air filtration systems that reduce airborne particulates to specified limits. Monitoring these airborne particulates provides useful data on the environment’s filtration, sources of contamination, and potential impact to the product or process. Selecting an aerosol particle counter is a choice influenced by the specific application and budget.
Cleanrooms are controlled environments where product manufacturing quality can be impacted by particulate contamination. These cleanrooms use active air filtration systems that reduce airborne particulates to specified limits. Monitoring these airborne particulates provides useful data on the environment’s filtration, sources of contamination, and potential impact to the product or process. Selecting an aerosol particle counter is a choice influenced by the specific application and budget.
Airborne Molecular Contamination
By changing the chemical, physical, electrical, or optical properties of highly engineered surfaces, airborne molecular contamination (AMC) can cause yield loss, product degradation, and loss of process control. Our AMC monitors help you detect contamination quickly.
By changing the chemical, physical, electrical, or optical properties of highly engineered surfaces, airborne molecular contamination (AMC) can cause yield loss, product degradation, and loss of process control. Our AMC monitors help you detect contamination quickly.