Kansai University

Chemical Reaction for Disposal of Waste Nitrogen Fluoride From Manufacturing Process of Semiconductors

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Courtesy of Kansai University

New technology to make trifluoro-nitrogen (NF3) gas harmless has been developed and a new concept on the removing toxic gas to be used in the process of manufacturing semiconductors is established. The NF3 gas is a toxic and special type of gas that is used in the process of manufacturing semiconductors and its specific application includes the dry etching of semiconductors, cleaning of CVD systems, an oxidation agent for rocket fuel etc. Recently, it is also attracting an attention as a high-energy source for chemical laser systems. As, NF3 is, however, toxic and highly stable chemically, so if discharged into the atmosphere, is liable to exert far-reaching adverse influences on global warming in the same manner as carbon dioxide gas and freon gas, if discharged into the atmosphere.

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