Inderscience Publishers

Direct patterning of metal oxides by hard templates and atomic layer deposition

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We describe a procedure for one-step patterning of thin films of metal oxides (TiO
2
, Al
2
O
3
, and ZnO) using reusable hard templates and atomic layer deposition (ALD). This procedure, called contact area lithography (CAL), was inspired from an idea of pattern transfer at a contact area, which realises high patterning fidelity, and enables a universal approach for the nano/micrometre scale patterning of both inorganic and organic thin films, such as self-assembled monolayers [

Keywords: contact area lithography, atomic layer deposition, metal oxides, hard template, patterning

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