FTIR Spectroscopy is a widely used technique for gas analyses in industrial applications. It is a technique used in the semiconductor industry for measuring the purity of cleaning, etching, and epi-treatment gases used with various process tools, reactors, and abatement devices. Among chemical companies and R&D facilities, FTIR is applied to combustion thermodynamics and stack gas emissions; and it is broadly used for building and plant ambient air monitoring.
There is a belief among some end users and among some FTIR suppliers that high resolution—namely 0.1 or 0.5 cm-¹—is absolutely required of an FTIR spectrometer to achieve high accuracy concentration measurements in any of the
above applications. However, there are substantial citations in the published literature to discount that supposition on high resolution; those citations indicate that instrument resolutions of 2, 4, 8, or 16 cm-¹ are more than adequate to provide high quality concentration measurements for most industrial applications.