Mass spectrometry helps us to develop materials with controlled chemical and physical properties using plasma nanotechnology
We are focused on the preparation of advanced organosilicon nanostructures with controlled physicochemical properties enabling the binding of organic material with inorganic material. An example is the association of a polymer with glass, two incompatible materials, which must be joined by a strong covalent bond. The recent development of high-performance composite materials is associated with the synthesis of highly sophisticated nanostructures in which one material (polymer) is transformed into another material (glass) continuously without interfaces in the range of only 100 nm based on model simulations.
Organosilicon coatings are deposited by many types of techniques from liquid phase (e.g., dip coating, spray coating, spin coating, electrochemical techniques, self-assembled coating, Langmuir-Blodgett coating) or vapour phase (e.g., chemical vapour deposition (CVD), physical vapour deposition (PVD), atomic layer deposition (ALD), molecular layer deposition (MLD)). In most cases, the chemical and physical properties of organosilicon coatings depend on the technique used and the wet chemical techniques lead to coatings containing numerous atom-level imperfections that impair the ability to control properties of coatings. Among CVD techniques, plasma-enhanced CVD (PECVD) operated al low pressure has the technological potential to synthetize atomically accurate materials from small molecule fragments and/or individual atoms to control coating properties. However, the commonly used precursor-sufficient regime allows the properties of the coating to be controlled to a limited extent.