IWA Publishing

IWA Publishing

NDMA formation potential removal in treated effluent by UV/H2O2 process


Courtesy of IWA Publishing

NDMA formation from treated wastewater is one of the concerns in water reuse. This study focused on NDMA formation potential (NDMAFP) removal in wastewater treated effluent by UV/H2O2 technology. A UV/H2O2 system was tested for the removal performance on both organic precursors and NDMAFP. The system consisted of a low pressure ultra-violet (LPUV) with an intensity of 2 mW/cm2 and a H2O2 dosage of 100 ppm. Reaction time was 60 minutes. Two types of wastewater treated effluents were collected: activated sludge process (ASP) effluent and membrane bio-reactor (MBR) effluent. Results showed efficient dissolved organic carbon (DOC) removal (70%). Dissolved organic nitrogen (DON) removal was less efficient (20–30%). Eighty per cent of NDMAFP in ASP effluent was removed within 1 hour. However, no NDMAFP removal was discovered in MBR effluent. This indicated that the effect of the UV/H2O2 system on NDMAFP removal was water specific. A generation of intermediate NDMA precursors was observed in the ASP effluent. Results indicated that sufficient oxidation should be provided to reduce intermediate NDMA precursors and to achieve NDMAFP removal.

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