Hiden Analytical Ltd.

Thin Film Applications of the UHV-TPD Workstation

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Courtesy of Hiden Analytical Ltd.

A successful method for investigating the microstructure of thin films by thermal effusion measurements is Temperature Programmed Desorption (TPD), also known as Thermal Desorption Spectrometry (TDS) or Thermal Desorption Analysis (TDA). Analysis by TPD involves positioning the sample in an Ultra High Vacuum (UHV) chamber and heating the sample at different linear temperature ramp rates while collecting the desorption spectra using a quadrupole mass spectrometer. The desorption process must be measured in UHV conditions to eliminate contaminating elements from the study. The Hiden TPD Workstation is a complete experimental setup designed for this and many other applications and is optimised to obtain maximum sensitivity for desorption species ranged from 1 – 300 amu.

Thin Film Applications of the UHV-TPD Workstation

UHV-TPD with Hiden Analytical

Hiden TPD Analyser for Thermally-Evolved Gas Measurement

Thin Film Applications of the UHV-TPD Workstation

Hiden Analytical’s complete experimental UHV-TPD Workstation is equipped with a multiport UHV sample chamber and a heated sample stage of up to 1000 °C with integrated PID controls. This hardware is equipped with a high precision triple filter analyser, for time/temperature-resolved analysis of desorbed species with unmatched sensitivity. This equipment has proven successful in numerous areas of product and technology research and development, including:

  • Thin films;
  • Photovoltaics;
  • Semiconductors;
  • Materials characterisation;
  • H2/D2/T characterisation in fusion reactor wall tiles;
  • Surface science.

The UHV-TPD workstation is primarily geared towards the study of novel semiconductor manufacturing, providing actionable data regarding the adsorbed species on thin films. This is valuable for diagnosing performance issues and potential sources of contamination in the production chain.

With a real-time 3D bar view, unknown elements can be rapidly and easily identified against the mass spectrometer’s built-in mass spectral library.

UHV-TPD studies are also focused on the outgassing properties of high performance materials used in extreme environments, with fully-automated temperature control and analysis enabling high-throughput TPD measurements of coated silicon surfaces.

UHV-TPD Workstation from Hiden Analytical

Hiden Analytical has been developing, manufacturing, and supplying cutting-edge quadrupole mass spectrometers for some of the most advanced forms of material analysis currently performed. Our UHV-TPD workstation provides a unique solution for advanced electronics manufacturing and research and development into novel energy storage materials.

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