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  • Laser Diode Manufacturing FREE On Demand

    Laser Diode Manufacturing FREE On Demand

    Listen to our experts Dr Mark Dineen and Dr Owain Thomas as they discuss how plasma process solutions for etching and deposition can be used to get the most from your device. We hope you find this webinar helpful. Find out more! For any questions ...

  • NEW White Paper Defining an optimal plasma processing toolkit for Indium Phosphide (InP) laser diode production

    NEW White Paper Defining an optimal plasma processing toolkit for Indium Phosphide (InP) laser diode production

    Read the white paper and learn how optimising plasma processing solutions can deliver the best device performance from your InP laser diode. We understand plasma, the relative merits ...

  • 5 Key elements to look for in your etch process

    5 Key elements to look for in your etch process

    High wafer throughput Fast etch rates and low clean overheads mean higher tool uptime. Higher uptime means more wafers through your fab Profile control Vertical facets means higher device efficiency – more light out for power in Smooth ...

  • Using THz spectroscopy to analyse atomic layer deposited (ALD) TiN

    Using THz spectroscopy to analyse atomic layer deposited (ALD) TiN

    Oxford Instruments and das-nano demonstrate non-destructive wafer based thickness and resistivity metrology for PEALD TiN. Commonly titanium nitride (TiN) thickness and resistivity wafer fab in-line metrology is based on ellipsometry and 4-point ...

  • Deposition – A question of choice

    Deposition – A question of choice

    Often the first question in any discussion on deposition processes is which technique is best suited. Often the answer to this question is clear, but in some cases it requires a detailed understanding of the application and production targets in ...

  • Atomic Layer Etching – Changing the Art of the Possible

    Atomic Layer Etching – Changing the Art of the Possible

    The society of vacuum coaters (SVC) deserves to be better known. It was founded in 1957 during a surge in the use of vacuum coating techniques such as sputtering and evaporation. The techniques go back a very long way: that man Edison ...

    Mike Cooke

  • UV LEDs making waves with clean water

    UV LEDs making waves with clean water

    Oxford Instruments systems now facilitate water purification technology With World Earth Day last week I’ve decided to make this weeks blog about how new technology is being used to enhance people’s lives in a fundamental way. The UN ...

    Mark Dineen

  • New Paper: Atomic layer etching using advanced plasma etch technology

    New Paper: Atomic layer etching using advanced plasma etch technology

    Scientists at Plasma Technology demonstrate Atomic Layer Etching (ALEt) of Silicon, using advanced technology  and plasma process knowledge. Read the article in JVST by Andy Goodyear and Dr Mike Cooke, Oxford Instruments Atomic layer etching ...

  • Who says materials analysis can’t be fun? Oxford Instruments brings “smart science” to the “smart phone”

    Who says materials analysis can’t be fun? Oxford Instruments brings “smart science” to the “smart phone”

    Everyone who works or studies in the world of materials and elemental analysis agrees on two guiding principles: Accuracy of analysis is vital and speed of analysis is critical where time equals money. Oxford Instruments’ new “Materials ...