ETG Risorse e Tecnologia S.r.l.

ETG - Model New Orion 3100 - Brochure

Ultra-sensitive, Real-time Measurement of Trace Ammonia , HCl , HF Gas in Clean Room in Lithography Process. The Deep Ultraviolet (DUV) lithography process has proven to be especially sensitive to many types of molecular level contaminates. Ammonia, and acid gases are known to create problems throughout the fab. The development of improved DUV ...