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  • Mid-Frequency Generator Tailored for Plasma Processing
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    Mid-Frequency Generator Tailored for Plasma Processing

    The versatile, variable-frequency LFGS generator (1250 W, 40 to 500 kHz) suits a wide variety of semiconductor and general plasma-processing applications, including sputtering, reactive ion etching, plasma deposition, polymerization, and surface treatment. Its compact 19", rack-mountable, air-cooled package eases installation and saves ...