CIC Photonics, Inc.
based in Albuquerque, NEW MEXICO (USA)
The company’s entry into the electronic specialty gas market originated in 1994-95 as a consequence of the semiconductor industry’s demand for increasingly higher purity gases from the major gas producers. The issue was then and remains today to be primarily moisture impurity levels in the cleaning, etching, and treatment gases used in wafer production. In that earlier period when common wafer sizes were 6” and 12”, the semi industry required moisture concentrations to be 250 to 500 ppb or better; with each year after that the industry tightened its requirements such that today the moisture specifications are 1 to 5 ppb or better.