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Monitoring of ultrapure water (UPW) systems using the Ultra DI® 20 Liquid Particle Counter
Courtesy of Particle Measuring Systems (PMS)
Abstract
Through continuous process and equipment advancements, semiconductor manufacturers are approaching 14 nm feature sizes and heading even smaller, while hard-disk drive fly heights are now less than 10 nm. This ever-reducing device feature size requires comparable cleanliness-level improvements in ultrapure water (UPW). UPW purity is especially important with its high use in direct contact with wafers as a final cleaning and rinsing agent in many production steps. Leveraging recent advances in laser optics and detector technology, the Ultra DI® 20 can effectively monitor UPW particle concentration ≥20 nm, or, in the case of metallic particles, ≥9 nm. Monitoring is continuous and occurs in real time to enable maximum process control. This industry-leading sizing sensitivity is provided in a system that correlates well with legacy 50 nm particle metrology for data continuity. The Particle Measuring Systems® (PMS) Ultra DI 20 was specifically developed to meet the challenges of microelectronics UPW cleanliness monitoring.
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