ENVEA (ex Environnement S.A) - Model LAS300XD - Cross Duct TDLAS Laser Absorption Gas Analyzer
TDL analyzer for cross stack measurements of hydrofluoric acid HF, hydrochloric acid HCl, ammonia NH3, Low and high carbon monoxide CO, Oxygen monitoring O2.
Versions of the LAS 300 XD are available to meet your analytical requirements:
- LAS300XD-NH3 for ammonia (NH3) and water (H2O) monitoring
- LAS300XD-CO for low and high concentration carbon monoxide (CO) monitoring
- LAS300XD-HCl for hydrochloric acid (HCl) and water (H2O) monitoring
- LAS300XD-HF for Hydrofluoric acid (HF) monitoring
- LAS300XD-O2 for Oxygen monitoring
- High sensitivity - ppb, ppm and % concentrations
- Interference-free gas measurements
- Large dynamic range
- Absolute measurements: no drift, no calibration, linear response
- Real-time - 1s response
- In-situ and non-invasive measurement
- Suitable for harsh environments. Unaffected by contaminants - no corrosion
- Small size
- No sample lines required, eliminating errors due to gas sampling
- Low maintenance and low cost of ownership
Process analysis, Combustion control, Emission monitoring, Chemical industry, Fertilizer plants, Petrochemical industry, Power plants, Waste incinerators, Cement industry, Glass industry, Pulp and paper, Scrubber technology, Biomass boilers...
The LAS 300 XD is ideal for ammonia slip measurement in DeNOx units (SCR and SNCR applications) and in urea/fertilizers plants. The LAS 300 XD is also ideal for HCl, CO or O2 measurements in raw gas measurement applications and in combustion applications (utilities).
The Tunable Diode Laser Spectroscopy (TDLS) is the perfect technology to use when you are looking for a selective measurement and a fast response time on some gas components as NH3, HCL, HF, low or high CO, or even O2 when conditions are too rough for standard O2 Zirconia In-Situ analysers. It uses a solid-state laser source with a wavelength that can be adjusted to the gas component unique spectrum, also called gas component “fingerprint”. TDLS method is a non-contact optical technology and therefore the emitter (laser source) as the sensor stays protected from any contamination or corrosion and so the maintenance operation and the cost of operation are very low compared to other technologies.
The LAS 300 XD uses a semiconductor laser light source that is rapidly tuned over the absorption peak of the gas being measured.
The LAS 300 XD uses fast, advanced signal processing electronics and Direct Absorption Spectroscopy (DAS). This combination leads to very low noise DAS measurements that are comparable or often better than those made using wavelength modulation spectroscopy (WMS).
Main advantages of LAS 300 XD technology:
- Sensitive. With a large dynamic range
- Accurate. The laser absorption relates directly to the quantity of gas being measured at a molecular level. This leads to extremely accurate measurements using fundamental and proven signal-processing algorithms in both single gas and multi-gas applications.
- Linear. No complex calibration curves required. Unaffected by changes in background species.
- Fast. Rapid laser tuning ensures an accurate measurement even with fast changing process conditions.
LAS 300 XD gas analyzers are very easy to install. The two main parts are arranged on opposite sides of the duct. The Transmitter is on one side and the Receiver is on the opposite side.
The Transmitter contains the laser along with the signal processing and communication electronics. The Receiver contains a photodetector and is connected to the Transmitter unit by a cable.
Alignment of the two units is simple thanks to the alignment bellows supplied with the LAS 300 XD. For additional help with alignment, an alignment tool is available.
The LAS 300 XD includes a window purge system as standard. Options are available to help with the installation and arrangement of the purging system. For example: a complete purge system that includes blower/filter and regulator, when there is no instrument air available at the installation point.
- NH3 + H2O: 0 – 15 ppm / 0 – 500 ppm + 0 – 5% / 0 – 50%
- HCl + H2O: 0 – 10 ppm / 0 – 3000 ppm + 0 – 5% / 0 – 50%
- HF: 0 – 100 ppm
- CO (low): 0 – 500 ppm
- CO (high): 0 – 100%
- O2: 0 – 10% / 0 – 100%