Helios LAB-tn - Coating Measurement System
From Wafer Solar
Thickness and Refractive Index of Silicon Nitride For wafer based solar cells the anti-reflective coating, surface passivation and diffusion barrier play an important role to achieve high solar cell efficiency and long term stability. Because of its excellent characteristics Silicon Nitride coating (a-SiNx:H) is widely used for this purpose. Process parameters like gas pressure and temperature of the cell during deposition have a strong influence on the layer thickness, colour and the optical constants n&k of Silicon Nitride. Traditionally it takes time and skills to obtain a precise coating distribution map to enable process optimization.
Measurement of Silicon Nitride
Measurement of Silicon Nitride
Using industry-proven spectrometer technology and proprietary measurement algorithms, Helios LAB-tn combines speed, precise measurement and easy operation - all of which are needed to optimize processes at lowest cost and shortest line downtime.
Functions of Helios LAB-tn
Helios LAB-tn is a measurement system with an easy to use one-axis sample table that enables you to create coating profile scans for the layer thickness as well as for the refractive index of the coated wafer with a few seconds!
Single-point measurement √
Layer thickness √
Refractive index √
Manual one axis positioning table √
Wafer-coating profile scans √
Table integrated reference √
Cost effective coating measurement tool √
Highlights of Helios LAB-tn
LAYER THICKNESS & REFRACTIVE INDEX OF SILICON NITRIDE
- Offline / contactless and non-destructive
- High-speed manual profile scan function
WORKS FOR ALL RELEVANT WAFER TYPES
- mc- & pc-wafers (polished, rough or textured)
- 125x125mm / 156x156mm
WORKS FOR ALL RELEVANT KIND OF TEXTURES
- Isotropic and anisotropic chemically etched
- RIE (Reactive Ion Etched)
WORKS FOR ALL RELEVANT DEPOSITION PROCESSES
- PE-CVD
- Magnetron Sputtering
EASY OPERATION
- Pre-configured mapping templates
- No special skills required for operation
- Position the wafer. Start measurement. GO!
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