Helios SCAN-tn - Model ETA-RT - Coating Measurement System
From Wafer Solar
Thickness and Refractive Index of Silicon Nitride For wafer based solar cells the anti-reflective coating, surface passivation and diffusion barrier play an important role to achieve high solar cell efficiency and long term stability. Because of its excellent characteristics Silicon Nitride coating (a-SiNx:H) is widely used for this purpose. Process parameters like gas pressure and temperature of the cell during deposition have a strong influence on the layer thickness, colour and the optical constants n&k of Silicon Nitride. Traditionally it takes time and skills to obtain a precise coating distribution map to enable process optimization
Measurement of Silicon Nitride
Measurement of Silicon Nitride
Using industry-proven spectrometer technology and proprietary measurement algorithms, Helios SCAN-tn combines speed, precise measurement and easy operation - all of which are needed to optimize processes at lowest cost and shortest line downtime.
Functions of Helios SCAN-tn
Helios SCAN-tn is a fully automatic measurement system that enables you to create coating distribution maps for the layer thickness as well as the refractive index of the coated wafer within less than one minute!
Layer thickness √
Refractive index √
Automatic XY positioning table √
Pre-configured mapping templates √
Automatic calibration √
Automatic coating distribution plots √
Single-point measurement √
Highlights of Helios SCAN-tn LAYER THICKNESS & REFRACTIVE INDEX OF SILICON NITRIDE
- Offline / contactless and non-destructive
- High-speed mapping function
WORKS FOR ALL RELEVANT WAFER TYPES
- mc- & pc-wafers (polished, rough or textured)
- 125x125mm / 156x156mm
WORKS FOR ALL RELEVANT KIND OF TEXTURES
- Isotropic and anisotropic chemically etched
- RIE (Reactive Ion Etched)
WORKS FOR ALL RELEVANT DEPOSITION PROCESSES
- PE-CVD
- Magnetron Sputtering
EASY OPERATION
- Pre-configured mapping templates
- No special skills required for operation
- Select recipe. Start measurement. GO!
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