EFC Gases & Advanced Materials products

Boron Trichloride is a liquified gas that decomposes in water to hydrogen chloride and boric acid. It is the main gas composition in High-K and metal anisotropic plasma etch, atomic layer etch, and pulsed plasm etch. BCL3 is also mainly used for fine etching of aluminum circuits in the manufacturing process of LCD panels.

Difluoromethane (HFC-32) is a colorless and flammable gas that finds widespread use as a primary refrigerant, as an important component in some refrigeration mixtures, and as a reactive ion etching gas in semiconductor materials processing applications. As a refrigerant, difluoromethane offers the advantages of low flammability combined with a reasonably low global warming potential (GWP = 677; Greenhouse gas protocol, Fifth Assessment Report AR5) making it an ideal refrigerant gas.