FirstNano Brand of CVD Equipment Corporation products

The EasyTube® 101 is a budget friendly, small footprint, reliable, and repeatable CVD system for the advanced R&D user. The system has a usable processing area of 25 mm x 50 mm. Up to 8 input lines are available for gases. 3 of the input lines can be configured for vapor delivery of solid or liquid sources. The system can be configured for vacuum and/or atmospheric processes. Most system options are available as upgrades after installation. The system is designed to meet today’s safety standards for handling  pyrophoric, corrosive, flammable, and toxic gases such as hydrogen, silane, germane, diborane, hydrogen chloride, and metal organic precursors. The system has application configured safety protocols embedded into relay logic, PLC, and CVDWinPrC™ software. Our entry level EasyTube® 101 is the product of choice for the researcher that has a limited budget and floor space, and needs turnkey equipment with a baseline process recipe, and a proven safety system.

The EasyTube® 3000 advanced CVD system is our best-selling and most capable product for university labs and industry R&D facilities. The base system includes a cylindrical quartz process tube which can be from 70 mm to 130 mm ID depending on the desired substrate size. A range of optional modules can be configured to meet the specific requirements of the end user. Many of the options are available as upgrades after installation. The system is designed to meet today’s safety standards for handling  pyrophoric, corrosive, flammable, and toxic gases such as hydrogen, silane, germane, diborane, hydrogen chloride, and metal organic precursors. The system has application configured safety protocols embedded into relay logic, PLC, and CVDWinPrC™ software.

The EasyTube® 3000 series advanced CVD systems are our best-selling and most capable product for university labs and industry R&D facilities. The base system includes a cylindrical quartz process tube which can be from 70 mm to 130 mm ID depending on the desired substrate size. A range of optional modules can be configured to meet the specific requirements of the end user. Many of the options are available as upgrades after installation. The EasyTube® 3000EXT model has an extended frame size to accommodate the larger system modules. These can include a glovebox, loadlock, a rolling furnace for rapid heating and cooling, an upstream RF plasma generator, and/or an option to increase the process chamber ID up to 200 mm to accommodate full 6” wafers.

The EasyTube® 6000 series multi-tube horizontal furnace systems are automatically controlled research units for batch processing of up to 50 wafers per run per tube (process dependent), in up to four separately configured process tubes. Our ET6000 series systems are used for complementary metal oxide semiconductor (CMOS), photovoltaics (PV), micro electro mechanical systems (MEMS), and nano electro mechanical systems (NEMS) research to perform oxidation, annealing, diffusion, silicon oxide, and nitride deposition processes. The systems are designed to meet today’s safety standards for handling pyrophoric, corrosive, flammable, and toxic gases such as hydrogen, silane, germane, diborane, hydrogen chloride, and metal organic precursors.