Plasma-Therm products

THERMAL PROCESSING

Plasma-Therm - RTP System

The Heatpulse RTP System is an advanced rapid thermal processing solution designed for a wide range of semiconductor applications. This system is capable of processing various materials, including silicon, silicon carbide (SiC), gallium arsenide (GaAs), gallium nitride (GaN), quartz, and sapphire. Such versatility makes it suitable for diverse substrate sizes and types. The Heatpulse RTP operates within a single-wafer chamber, rapidly heating wafers and maintaining precise temperature control through closed-loop systems. This technology is extensively used in semiconductor processes such as post-implant annealing, oxide and nitride film growth, reflow, and the formation of silicides, salicides, and metal alloys. The system is supported by the Cortex® control system, which offers a stable and user-friendly interface, boosting efficiency and productivity. Plasma-Therm also provides support and upgrades for legacy systems like the AG Heatpulse 8108 and 8800.