The SiC thin film used in LED chip epitaxy and silicon single crystal substrates has a cubic phase with the same crystal lattice structure as diamond, and it is second only to diamond in hardness. SiC is a widely recognized wide-bandgap semiconductor material with immense potential for application in the semiconductor electronics industry, and has excellent physical and chemical properties, such as high thermal conductivity, low thermal expansion coefficient, and high temperature resistance and corrosion resistance.

In the production of electronic devices, wafers must pass through several steps, including silicon epitaxy, in which the wafers are carried on graphite susceptors. The quality and properties of the susceptors play a crucial role in the quality of the wafer`s epitaxial layer. Graphite base is one of the core components of MOCVD equipment, and it is the carrier and heater of the substrate. Its thermally stable Performance parameters such as thermal uniformity play a decisive role in the quality of epitaxial material growth, and directly determine the average Uniformity and purity.

At Semicorex, we utilize CVD to manufacture dense β-SiC films on high-strength isostatic graphite, which has higher purity compared to sintered SiC materials. Our products such as SiC coated graphite susceptors endow the graphite base with special properties, making the surface of graphite base compact, smooth and non-porous, superior heat resistant, thermal uniformity, corrosion resistant and oxidation resistant.

SiC coating technology has gained widespread use particularly in LED epitaxial carriers’ growth and Si single crystal epitaxy. With the rapid growth of the semiconductor industry, the demand for SiC coating technology and products has increased significantly. Our SiC coating products have a wide range of applications in the aerospace, photovoltaic industry, nuclear energy, high-speed rail, automotive, and other industries.

Product Application

LED IC epitaxy
Single-crystal silicon epitaxy
RTP/TRA wafer carriers
ICP/PSS etching
Plasma etching
SiC epitaxy
Monocrystalline silicon epitaxy
Silicon-base GaN epitaxy
Deep UV epitaxy
semiconductor etching
photovoltaic industry
SiC Epitaxial CVD system
SiC epitaxial film growth equipment
MOCVD reactor
MOCVD system
CVD equipment
PECVD systems
LPE systems
Aixtron systems
Nuflare systems
TEL CVD systems
Vecco systems
TSI systems

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