W&L Coating Systems GmbH
5 products found
W&L Coating Systems GmbH products
W&L - The Coaxial Bladed Reactor (CBR) System
The Coaxial Bladed Reactor (CBR) System is an advanced microwave plasma-enhanced chemical vapor deposition (PECVD) system designed explicitly for single crystal diamond growth and the deposition of microcrystalline diamond layers over a 4-inch circular area. Central to its operation is an interrupted coaxial transmission line with a built-in abrupt impedance transformation housed within a non-resonant process chamber. The system is powered by a robust 15 kW, 2.45 GHz microwave generator, allowing for process pressures exceeding 180 hPa. This formidable setup can heat a molybdenum substrate carrier plate to over 1000°C, necessitating efficient water cooling for both the substrate and the microwave transmission line. The CBR system offers six optical viewports for visual and infrared inspection of plasma discharge, ensuring precise thermal control of the substrates. It features a motor-driven, PLC-controlled substrate stage for accurate substrate height adjustments, crucial for uniform microcrystalline diamond layers and single crystal growth. The system supports automation via Siemens PLC and a human-computer interface for remote operation, enabling prolonged single crystal diamond growth of up to two weeks. The system is designed for homogeneous plasma-enhanced chemical vapor deposition of diamond layers using 2.45 GHz microwave power, promising competitive costs against the use of 915 MHz power.
W&L - Nano Crystalline System
The NCS (Nano Crystalline System) platform is designed for advanced vacuum plasma chemistry processes with a focus on nano crystalline diamond deposition. Utilizing microwave plasma-enhanced chemical vapor deposition (PECVD), the system ensures high deposition rates across large areas by employing linear coaxial plasma lines. The NCS machines feature water-cooled aluminum frames, stainless steel cladding, and tailored process gas systems. The vacuum pump configurations typically involve a two-stage dry pump system, combining Scroll or Screw pumps with Roots blowers. System control leverages Siemens PLC communication via Profibus/Profinet, ensuring operational stability. Optical emission spectroscopy (OES) facilitates long-term process monitoring. The NCS 12-200 model, a versatile research tool, offers 12 kW of microwave power and can be pulsed up to 100 kHz, suited for developing microwave PECVD thin film processes. The NCS 48-620/1000 is tailored for mass production, featuring 48 kW of microwave power and 16 linear coaxial plasma lines for coating large rectangular substrates. The platform's modular design, integrated heating solutions, and precise microwave power management optimize production efficiency.
W&L - Table Top Sputtering Systems
The NMS 250 and NMS-BM 270 are innovative sputtering systems designed for the material-efficient physical vapor deposition (PVD) of precious metals and other conductive materials on three-dimensional substrates. These systems are engineered to minimize the use of expensive coating materials by ensuring that the sputtered material not deposited on the substrates returns to the sputter target for further use. This closed-loop design significantly enhances material utilization and eliminates wastage. The small, front-side copper shields on the systems absorb any residual sputtered material, which can be easily recycled. The NMS 250 is compact and ideal for smaller series, providing a coating volume of approximately 200 mm in length and 60 mm in diameter, making it suitable for precise, high-quality coatings of individual parts. The NMS-BM 270, on the other hand, caters to bulk material coatings up to 0.3 liters, operating with a coating rate varying between 5 to 20 nm/min depending on the material and process. Both systems are designed for economical, high-quality sputtering, require no specialist personnel, and feature a programmable logic controller (PLC) with an integrated computer and display for easy operation. They also allow quick target material changes and maintain low vacuum base pressure for high productivity, making them ideal for a range of functional and decorative applications.
W&L - Rotating Tube Magnetron Sputtering Cathode
The RTM 25/80 Rotating Tube Magnetron Sputtering Cathode offers an innovative approach to magnetron sputtering, particularly valuable for its economic benefits associated with tubular sputtering targets. By rotating the tubular target through the plasma, the system ensures efficient cooling, allowing significantly higher power densities on the target surface compared to planar targets. This results in increased deposition rates and enhanced cost-effectiveness of the sputtering process. The RTM 25/80 features an integrated magnetic field and target cooling system within the target tube. Users can select the nominal target length in 50 mm increments between 200 and 1000 mm, with an option to extend the target length up to approximately 2000 mm using an additional counter bearing. This flexibility makes the RTM 25/80 an adaptable and powerful solution for various sputtering applications, optimizing deposition rates and cooling efficiency to improve overall productivity.