AVS Webinar: Atomic Layer Deposition from an Applications Perspective - Brochure

Over the last two decades Atomic Layer Deposition (ALD) has become a key enabling method with a multitude of applications benefiting from the (ultra)thin films that can be prepared with precise thickness control and with unparalleled uniformity and conformality on substrates with a demanding surface topology. In this webinar the method of ALD will be presented with a focus on various applications of ALD: both in the lab and in the fab; from high volume manufacturing to niche markets;  from emerging technologies to proof-of-concepts. Special attention will be given to the key features that ALD provides for these specific applications as well as the associated ALD configurations and types of equipment.