Despatch - DF In-Line Diffusion System Brochure

u DF In-line Diffusion System Diffusion for highly uniform emittersThe Despatch In-line Diffusion Furnace incorporates advanced infrared thermal technology that provides the tight temperature uniformity needed for increased cell efficiencies. Air is passively preheated as it enters the chamber and lamps on top and bottom along with edge heaters effectively transfer heat to the wafers. Automated drop-down access to the chamber reduces maintenance time and the insulation in the first zones of the furnace is easily removed if it becomes contaminated. The furnace provides advanced profile capability and a fully comprehensive software system. In-line processing offers reduced wafer handling and greater throughput than batch processing. With less handling you will have less breakage and increased yield. The Despatch Diffusion Furnace combined with USI’s Deposition tool consistently produces highly uniform emitters using aqueous-based doping. This repeatability enables higher sheet resistances, excellent yields and optimum cell efficiency. FeatureS at a glanceu High volume productionu Exceptional thermal uniformity ± 1°C in the dwell regionu Closed loop temperature controlsu Advanced graphical user interface u Safe, simple chamber accessibilityu High production up-timeu Ease of maintenanceI n S P I r e D I n n O V a t I O nHigh ohm emmiter capability Industry best emitter uniformity Best-in-class uptime and yieldM i n n e a p o l i s • s h a n g h a i • B e r l i n • s i n g a p o r e • h s i n c h u • T o K Y oDF 3630 PrODuctIOn ScalePrODuct cOnFIguratIOnSystem size (length x width x height) 15,329 × 1,870 × 1,750 mm (603.5 x 74 x 69 inches)Standard entrance table 914 mm (36 inch)Heated length 10,516 mm (414 inch)Cooling length 1,829 mm (72 inch)Standard exit table 914 mm (36 inch)Conveyor type Lightweight balance spiral weave, Nichrome V materialConveyor height above floor 97.8 cm +/-3.6 cm (38.4 in +/-1.5 in)Product clearance 6.4 mm (0.25 inch) Number of Lanes (156 x 156 mm) 5Conveyor width 914 mm (36 inch)PrOceSS caPaBIlItIeSMaximum temperature 1000 °C (1832 °F)Approx. throughput (156 x 156 mm) 1200-1400 wafers/hrConveyor speed range 10–100 cm/min (4-40 ipm)Conveyor speed accuracy ± 0.5%Conveyor speed control Closed loop feedbackWafer size 100x100, 125x125, 156x156 mm (4, 5, 6 inch) Option for 210 x 210 mm (8 inch) supportSheet resistance 40 to >120 ohm/sq configurable© 2011 Despatch Industries. All rights reserved. Despatch is a registered trademark of Despatch Industries in the U.S. and other countries. DF-6-11IntegrateD PrOceSS conTrol sYsTeMu Doper/Furnace recipe creationu Process window monitoring with audible and visual alarmingu Real-time process window displayu Data loggingu Process repeatability In-lIne DIFFuSIOn Furnaceu Tight temperature control for maximum process windowu Maximum up-time for higher yieldsu Process profiles for high efficiency solar cells8860 207th Street West Minneapolis, MN 55044 USAwww.despatch.comuSa HeaDquarterSPhone: 1-952-469-5424 toll free usa: 1-888-337-7282 fax: 1-952-469-4513sales@despatch.com service@despatch.comglOBal OFFIceSgermany: +49 30 629 073 410 / europe@despatch.com china: +86-21-62365868 / shanghai@despatch.com taiwan: +886-3-6588484 / taiwan@despatch.com Japan: +81-42-729-5355 / japan@despatch.comThe Despatch Diffusion Furnace combined with USI’s Deposition tool is a reliable system for highly uniform emitters.A plasma system is available for chemical-free conditioning of the wafer surface.OPtIOnSu Water-cooled heat exchangeru Failed element monitoru Master production control interfaceu Profiling systemsu Ultrasonic belt cleaner/dryeru Uninterruptible power supplyu Extended process profilesu Conveyor table extensionsu CE Compliance