EasyTube 2000 System

The EasyTube® 2000 is an advanced turnkey chemical vapor deposition system for the synthesis of a wide variety of thin films and nanomaterials. The base system can process 50 mm x 50 mm diameter substrates and has a 3-zone resistance heated furnace. The system is optimized for controlled process development and user safety. Our modular platform includes a range of options which can be configured to meet your specific processing requirements. Many of the options are available as upgrades after installation. The system is designed to meet today’s safety standards for handling pyrophoric, corrosive, flammable, and toxic gases such as hydrogen, silane, germane, diborane, hydrogen chloride, and metal organic precursors.