Fabrication System-NEO-Series

Nanofabrication systemNEO-500Nano Engineering Optical SystemSystem OutlineBlock Diagram Nanofabrication system, NEO-500, is developed withNational Institute of Advanced Industrial Science andTechnologies based on thermal lithography methodcombined laser lithography method and thermal non-linearmaterial. The system can fabricate nano-scale structure on thewide-area with low-cost and high-speed. The size of thesystem is desktop type and can be used in the laboratory.Specification·Wavelength·NA·Max output·Laser class·Tr/Tf·OL actuator·Stage resolution·Stage accuracy·Stage drive method·Spindle motor·Jitter·Dehumidification·Thermal modulation·Objective sample·Samle size:405nm:0.85:20mW Pulse(Autopower control):Class 2M:1.4ns:Single axis VCM(Autofocus):5nm/0.07nm:±30nm/±4nm:Piezo-electric device/VCM:DC motor/Air spindle motor:s<0.01%/s<0.0005%:None/Equipped:None/Equipped:Si, SiO2, etc.(AIST):5 inch wafer size(Customizable)Function and Application SPMPUHNano StageLD Cont BoardAuto Focus ControlLD ControlControlUnitSPM Control PCUSBRS232Mechanical UnitNanoStageControlUnit ·Creation of nano dot pattern Continuous dot pattern Periodic dot pattern ·Creation of nano-scale grating Application example ·Optical filter ·Antireflective structure ·Photonic crystal ·Nano-imprint mold ·BiotechnologyPhoto providedExample of nano dot patternSectional picture Center for Applied Near-field Optics ResearchRIENAIONAL INSUTITUTE OFADVANCED INDUSTRIAL SCIENCEAND TECHNOLOGY(AIST)Optics and System structureCustomization?This specs may change without prior notice.System structureLight intensity distribution in spot anddrawing area by thermal distributionE.g. SiO2 board fabricated by NEO-500E.g. Optical characteristic of SiO2 board This system can be customized according with thecustomer request. ·Optics, Spot size, Laser output ·Nano stage, Feed accuracy ·Chack mount structure, etc. Sample board for evaluation will be manufacturedby Center for Applied Near-field Optics Research,AIST.2006.03.40MEMO