Monitoring Dissolved Ozone Concentration in Semiconductor Wet Benches using the 470 - Application Note

Ozone is a versatile oxidizer and is commonly used in semiconductor wet bench applications for cleaning, particle and photoresist removal. There are several advantages to using ozone in these applications including: reduced useof harmful chemicals such as hydrofluoric acid, minimization of typical chemical waste used in mentioned process, increased cleaning and efficiencies.As the complexity of semiconductor wafer structures increases, the use of ozone will continue to play an important role in the manufacturing processes of those wafers.To fullyrealizethe potential of the advantages,it is important to be able to measure the concentration of ozone present or injected in the process.Therefore an in-line ozone concentration monitor is required for careful controlofthe amount of dissolved ozone in a liquid.