MSP - Model 2940 - Liquid Flow Controller Datasheet

Converting a liquid flow into a steady vapor stream is a key step in processes for forming thin films or creating bulk material through surface reaction chemistry. MSP has created a family of TurboVaporizers™ to meet the modern demands of precursor vaporization in semiconductor device fabrication. These vaporizers are used in world’s most advanced semiconductor device fabs for fabricating thin film devices by CVD, PECVD and ALD processes.