NanoSilica - Model 2260 - Nanoparticles Sizing Standards Datasheet

NanoSilica™ Size Standards from MSP Corporation are concentrated aqueous suspensions of SiO2 particles with highly uniform size distributions. These particle size standards, currently available in nominal sizes ranging from 18 to 200nm, are ideally suited for producing high-quality calibration standards for the next generation of wafer inspection tools and photomask inspection systems. Unparalleled quality can be achieved when NanoSilica Size Standards are deposited by MSP’s 2300NPT Particle Deposition System onto wafers or photomasks. Older particle deposition tools manufactured by MSP or those from other manufacturers are also suitable for deposition of these particle size standards.

Advanced manufacturing of semiconductor devices at technology nodes below 30nm requires a new generation of defect review and inspection tooling to maintain device yield. Historically, wafer inspection tools, photomask inspection tools, Comparison of size distributions of a commercially available PSL size standard (30nm) and MSP’s NanoSilica (30nm). Suspensions of particles were aerosolized with aerosol electrospray (TSI Model 3480). Size distributions were measured by particle mobility spectrometry (MSP Model 1500). Particle suspensions were diluted in equal volume ratios.