A NOVEL PHOTOLITHOGRAPHIC PRINTING APPROACH

BEAM PEN LITHOGRAPHY

Harness the utility of BPL to rapidly prototype functional devices and create arbitrary surface patterns with nano-to-microscale resolution.

Beam pen lithography (BPL) uses a specialized, massively parallel array of apertured probes with a highly advanced digital light processing (DLP) module to independently control hundreds of thousands of microbeams of light in parallel.

With BPL, each probe can create an individual micropattern or all probes in the array can work in concert to stitch larger mm² scale designs in a seamless manner.

The resolution of BPL is defined by probe aperture size. By making the apertures small enough, sub-diffraction limit (

Not only is BPL wavelength agnostic, but also operates in an ambient environment (does not require a vacuum). As such, BPL can be used for patterning a broad spectrum of soft and hard materials.

Printing With Beam Pen Lithography

Patterning time	28 minutes
Pen Array Spacing	25 μm
LED Engine	405 nm
Feature Size	800 nm
Total Patterned Area	3.84 mm x 5.12 mm

TERA-Fab - Model E series 2.0 - Beam Pen Lithography (BPL) System Brochure