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Omni R&D - Model ORD1200RTRIII -1200°C Omni R&D High Precision Roll-to-Roll Continuous Graphene Growth System
Roll-to-Roll PECVD (Plasma-Enhanced Chemical Vapor Deposition) Systems represent a leap forward in the field of advanced materials processing. These cutting-edge systems are engineered to continuously produce high-quality graphene on flexible substrates like copper foil, providing an efficient and cost-effective solution for large-area graphene film production. By utilizing advanced temperature control, gas flow management, and sophisticated process monitoring, these systems ensure superior performance and reliability. Key benefits include increased throughput, improved uniformity, and reduced material waste compared to traditional batch processing. Additionally, the process parameters such as temperature, pressure, gas composition, and plasma characteristics can be meticulously controlled to produce graphene with specific electrical, optical, mechanical, and thermal properties. This customization enables the material to meet the diverse needs of industries ranging from electronics and optoelectronics to energy storage and advanced composites. Whether for academic research or commercial-scale production, Roll-to-Roll PECVD Systems are pivotal in unlocking the full potential of graphene technology.
Omni R&D, LLC is proud to present the ORD1200RTR-III-80, a state-of-the-art Roll-to-Roll PECVD system designed for continuous graphene growth. This advanced material research equipment is ideal for both academic and industrial settings, offering precision material processing and high-quality graphene production. With its superior temperature control, gas flow management, and safety features, the ORDRTR-III-80 is a must-have for researchers and manufacturers in the field of graphene technology.
The ORD1200RTR-III-80 is a cutting-edge Roll-to-Roll PECVD system that enables the continuous growth of high-quality graphene. Equipped with an industrial computer control system, this advanced equipment automatically regulates furnace temperature, feeding and discharging, gas flow, and gate actions. The system utilizes imported key components to ensure high reliability and performance, while the process pipeline is composed of imported valves and pipe fittings, providing excellent airtightness, corrosion resistance, and pollution-free operation. The ORD1200RTR-III-80 features closed-loop automatic control of working pressure, high-precision temperature control, and safety protection functions, making it an ideal choice for both research and industrial applications.
- Industrial computer control system for automatic regulation of furnace temperature, feeding and discharging, gas flow, and gate actions
- Imported key components ensure high reliability and performance
- Process pipeline composed of imported valves and pipe fittings for excellent airtightness, corrosion resistance, and pollution-free operation
- Closed-loop automatic control of working pressure improves process stability and reliability
- High-precision temperature control with good stability in the temperature zone
- Power failure alarm, over-temperature alarm, and other safety protection functions
- High-quality heating furnace body ensures high stability and long life of the constant temperature zone
- Separate motor speed regulation for inlet and outlet parts, with copper foil drafting functions
- Maximum temperature: 1200℃
- Working temperature: ≤1100℃
- Effective size of quartz tube: outer diameter Φ80mm
- Furnace chamber material: alumina, high-temperature fiber products
- Thermocouple type: K-type thermocouple (three points)
- Temperature control accuracy: ±1℃, 30-segment programmable temperature control, PID temperature control program, three-segment temperature control (200+200+200mm)
- Heating element: resistance wire
- Length of heating zone: 200+200+200mm
- Power supply: single-phase, 220V, 50HZ
- External dimensions: length 2800mm * width 700 * height 1200mm
- PE radio frequency power supply for PECVD upgrade
- High-quality mechanical pump with a cold state vacuum degree of 10-1pa
- Comprehensive temperature control system with intelligent program temperature regulating instrument and PID control
- Gas flow control system with mass flow controller for high control accuracy, stability, and gas adaptability