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ACEModel EMI/RFI -Shielding

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Advanced Chemical Etching’s photo etching process is an economical and flexible method of production. It can produce a wide range of EMI/RFI shielding solutions, from standard shielding/screening cans through to multi-cavity labyrinths, without the associated cost penalty for complexity of the design.

Key Facts About EMI/RFI Shielding

No Limitations

There is no limitation on the complexity of shape; any aperture configuration can be accommodated.

Variety of Features

The digital tooling is very inexpensive and modifications to tooling can be done very quickly and economically.

Burr & Stress-Free

All parts are burr and stress-free leading to minimum assembly time on the line.

Plating

Parts can be supplied plated for improved solderability, functionality, aesthetics and protection.

  • Low set-up costs and fast lead times make etching a go-to process in batch sizes of one to multiple millions.
  • The tooling for etching is digital, low-cost and can be modified quickly.
  • No heat or force is used when etching so mechanical properties remain unaltered and parts are free from stresses and burrs.
  • As component features are etched at the same time, part/feature complexity is not an issue.
  • Flat blanks etched then diffusion bonded or brazed.