Atomic Layer Deposition

ALD deposits ultrathin films with Angstrom level precision allowing the growth of a monolayer on powders. This solvent free process doesn’t require complex evaporation or waste treatment. ALD has superior control over nanocoating thickness, low waste generation and is flexible for a wide range of both coating and powder chemistries. Powall’s nanocoating technology takes the advantages of ALD and goes one step further! We produce nanocoatings with ALD level control but cost effectively and at scale.