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Neotec - Bubble Clean System
Compounds for which the solubility decreases as temperature increases may precipitate [e.g., CaCO3, CaSO4, MgCO3, MgSO4,FePO4, FeCO3, Al2(SO4)3] (EPA 2006). Photochemical reactions that are independent of sleeve temperature may cause sleeve fouling. (Derrick and Blatchley 2005). Parti cles and inorganic chemicals in water can be deposited on the lamp sleeve surface(Lin et al., 1999a & Walt et al. 2005).
Offline Chemical Cleaning
(OCC) The reactor is taken off-line, drained, and either filled or sprayed with cleaning solution to dissolve foulants on lamp sleeve surface. (Chemical treatment)
On-line Mechanical Cleaning (OMC)
Mechanical wiper moves along lamp sleeves and physically cleans foulants on sleeve surface. (Physical treatment)
On-line Mechanical-Chemical Cleaning (OMCC)
Wiper collar filled with chemical cleaning solution moves along lamp sleeves and dissolves foulants on sleeves while the wiper physically removes deposits. (Physical + Chemical
NEOTEC’s Bubble Clean System satisfies the shortcomings of conventional OMCC
- Microbubbles increase cleaning efficiency
- Externally installed and maintained Bubble Clean system can relieve maintenance inconvenience
- Cleaning solution can be visually checked for contamination and refilled with ease
- A leak detection and an automatic cleaning solution supply valve close system
Existing OMCC System
- Continuous contamination of injected chemical cleaning solution
- Only lower section of quartz is cleaned if some of injected chemical cleaning solution is leaked
- The entire cleaning solution must be drained and refilled even if only one quartz sleeve needs to be replaced
- Damage to wiper sealing can lead to chemical cleaning solution leak
- Inconvenience of lifting the entire module individually to refill chemical cleaning solution.
- Cf.) For large water treatment facility, hundreds of modules needs to be lift and chemical cleaning solution refilled (takes several days)
Bubble Clean
- Easy to check contamination level and refill the chemical cleaning solutio
- The chemical cleaning solution cleans entire section regardless of the leak & solution level
- No need to drain and refill the entire cleaning solution
- Leak detection and system that automatically closes chemical cleaning solution supply valve
- Only one external cleaning solution reservoir needs to be drained and refilled. Cf.) Only few minutes required regardless of the number of modules