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CMP Profile - Model II -Filter Capsules
FromPall Corporation
CMP Profile II Filter Capsules are designed for the filtration of both oxide and metal slurries at chemical mechanical polishing (CMP) tools.
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- Compact completely disposable capsule consists of an all polypropylene Profile II filter element in a heat-welded polypropylene shell.
- Profile II filter elements are technologically advanced depth filters with absolute removal ratings. The unique construction with built-in prefiltration assures long service life and consistent high level performance with neither breakthrough of contaminants nor shedding of filter medium.
- The availability of absolute filter removal ratings, from 1 µm to 70 µm assures selection of the capsules to match the range of CMP slurries.
- CMP capsules retain aggregated material and foreign matter and have not been shown to alter slurry polishing characteristics.
Materials
- Medium: Continuous polypropylene filament
- Core: Polypropylene
- Shell: Polypropylene
Removal Ratings
- 1 μm, 3 μm, 5 μm, 10 μm, 20 μm, 40 μm, and 70 μm (Profile filter removal ratings can be 5 – 10 times finer than traditional ratings for depth filters.)
Operating Conditions1
- Maximum Pressure:
- 100 psid/7 bar @ 100 °F / 40 °C
- Maximum Differential Pressure:
- 60 psid/4 bar @ 77 °F / 25 °C
- 30 psid/2 bar @ 140 °F / 60 °C
- Maximum Temperature:
- 140 °F / 60 °C @ 60 psi / 4 bar
Connections
- Inlet/Outlet: 1⁄4 in. NPT
