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CMP ProfileModel II -Filter Capsules

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CMP Profile II Filter Capsules are designed for the filtration of both oxide and metal slurries at chemical mechanical polishing (CMP) tools.

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  • Compact completely disposable capsule consists of an all polypropylene Profile II filter element in a heat-welded polypropylene shell.
  • Profile II filter elements are technologically advanced depth filters with absolute removal ratings. The unique construction with built-in prefiltration assures long service life and consistent high level performance with neither breakthrough of contaminants nor shedding of filter medium.
  • The availability of absolute filter removal ratings, from 1 µm to 70 µm assures selection of the capsules to match the range of CMP slurries.
  • CMP capsules retain aggregated material and foreign matter and have not been shown to alter slurry polishing characteristics.

Materials

  • Medium: Continuous polypropylene filament
  • Core: Polypropylene
  • Shell: Polypropylene

Removal Ratings

  • 1 μm, 3 μm, 5 μm, 10 μm, 20 μm, 40 μm, and 70 μm (Profile filter removal ratings can be 5 – 10 times finer than traditional ratings for depth filters.)

Operating Conditions1

  • Maximum Pressure:
    • 100 psid/7 bar @ 100 °F / 40 °C
  • Maximum Differential Pressure:
    • 60 psid/4 bar @ 77 °F / 25 °C
    • 30 psid/2 bar @ 140 °F / 60 °C
  • Maximum Temperature:
    • 140 °F / 60 °C @ 60 psi / 4 bar

Connections

  • Inlet/Outlet: 1⁄4 in. NPT