Crest Systems Group of Companies

Helios Nanolab

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What puts the Helios NanoLab in a class of its own is its ability to offer the highest imaging, contrast, stability and speed performance together with the largest range of SEM / FIB applications. It ensures best resolution, reproducible metrology and best control of the beam for writing purposes.

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The outstanding imaging capabilities of the Helios NanoLab start with its novel FESEM technology, featuring resolution in the sub-nanometer at 15kV and better than 1.5nm at 1kV without beam deceleration. Stunning image quality and contrast are achieved, especially when using the new Helios NanoLab through-the-lens detector. Its innovative design allows for superb imaging in SE and BSE modes over the entire energy range. When imaging is used for metrology purposes, Helios NanoLab introduces a significant breakthrough with its electron beam electrostatic scanning, which allows for pioneering accuracy performance.