Intellemetrics
Intellemetrics - Wafer Vision Systems for Vacuum Etch and Deposition Chambers
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Intellemetrics offers specialized Wafer Vision Systems crafted for inspecting patterned wafers inside load-locked vacuum etch and deposition chambers. These systems ensure the accurate loading, alignment, and placement of wafers concerning the mask pattern. The image resolution is contingent on the working distance and field of view, with typical resolutions of 5µm achievable at 600mm working distances. This setup is optimal for ICP etch and deposition chambers with a field of view of 7mm. The vision systems are essential for maintaining precise wafer processing standards and ensure efficient workflow in semiconductor manufacturing environments.Most popular related searches
Intellemetrics introduces a range of Wafer Vision Systems specially designed for viewing patterned wafers within load-locked vacuum etch and deposition chambers in order to check that the correct wafer has been loaded, and to confirm alignment and placement with respect to the mask pattern.
Image resolution depends upon the working distance and field of view, but typically resolutions of 5µm can be obtained at working distances of 600mm (ideal for ICP etch and deposition chambers) and fields of view of 7mm.
- 5 Mpixel high resolution camera image
- Co-linear wafer illumination
- Imaging distance from 100mm to 1000mm
- Visible feature sizes down to 5um
- Manual and motorised focusing options