KLA - Model Archer -Overlay Metrology System

The Archer™ 750 overlay metrology system provides accurate feedback of on-product overlay error for fast technology ramps and stable production of leading-edge memory and logic devices. Wavelength tunability with 10nm resolution delivers accurate and robust overlay error measurements in the presence of production process variations. With productivity levels typically only seen with scatterometry-based systems, the Archer 750 imaging-based overlay system supports increased sampling for high order scanner corrections and high throughput for inline monitoring. Advanced algorithms and a novel rAIM overlay target design produce improved correlation between target and device overlay errors, helping lithographers accurately track device overlay performance.