KLA - Model ATL100 -Overlay Metrology System

The ATL100 (Accurate Tunable Laser) scatterometry-based overlay metrology system provides overlay control for development and high volume manufacturing at ≤7nm design nodes. Tunable laser technology with 1nm resolution paired with real-time Homing maintains high overlay accuracy in the presence of production process variations. The ATL100 supports a diverse range of scatterometry overlay measurement target designs, including in-die and small pitch, enabling accurate overlay error measurement for different process layers, device types, design nodes and patterning technologies.