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XERION - Lamp Furnace for Rapid Thermal Processing (RTP)
XERION BERLIN LABORATORIES GmbH specializes in high-performance lamp furnaces designed for rapid thermal processing (RTP) of semiconductor wafers and aluminium foaming applications. These furnaces achieve heating rates up to 100 K/sec, ensuring clean thermal processing within a quartz glass containment. They are particularly adept at foaming large aluminium plates, with surface areas exceeding 4 m², in just minutes. This is enabled by an integrated system with a heating capacity of up to 1,200 kW, forming a component of an automated cycle line. These systems are compact, allowing for easy integration into existing equipment. Moreover, they accommodate temperatures up to 1,300°C, suitable for highly absorbing materials. These solutions aim to provide precise thermal control and high efficiency, catering to various industrial needs.Most popular related searches
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Lamp furnace for Rapid thermal Processing (RTP)
of semiconductor wafers. Heating rates up to 100 K/sec achievable. Clean thermal processing in quartz glass containment.
Lamp oven for foaming of aluminium plates
The plates can be over 4 m² in size and are foamed in a few minutes. The oven is part of an automatic cycle line. The installed heating capacity is 1.200 kW.
Extremely small heating system
The lamp heating system can be used in testing machines. Temperatures up to 1.300°C are possible for well absorbing samples. The heating system is extremely small and easy to install and remove in an existing system.