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Magnetron Sputtering Vacuum Coating Machine
MF sputtering technique has become the mainstream techno logy of magnetron sputtering, what characteristics superior to the DC sputtering are: Overcome the phenomenon of anode disappearance. Reduce or eliminate the abnormal arc discharge of target. Therefore, improve rhe stability of sputtering process technology, and increase the deposition rare of dielectric coaring.
New developed plane target, cylindrical target, twin target, opposite target and various structures if MF sputtering ta rgets. It is widely used in
watchband, watchcases, mobile shell, hard wares, tableware etc. It can deposit all kind: i of decora rive coatings such asTiN, TiC, TiCN,
TiAIN, CrN etc decorative coatings.
The Equipment offers coatings in various metal colors such as steel, nickel, gold. bronze. anthracite and black. The color of the coating is
determined by its composition, which is composed of zirconium, titanium, nitrogt sn, carb on, oxygen i and other metals . Our process
engineering team can fine tune the color according to your requirements, so that you ma y be unique in your market.
PRODUCT ADVANTAGE.
Magnetron Sputtering Vacuum Coating Equipment includes the following key Features:
- Effective: The deposition rate is fast
- Compact: Small footprint, easy to integrate into the factory
- Accurate: Accurate control of plating thickness
- High quality: The film has high purity, good compactness and uniformity
- Diversification: Mixed sputtering of different metals, alloys and oxides
- Remote access: Provide factory remote diagnostics