Eumetrys
Eumetrys - Model YPI-MX-DC -Particles Inspection Unit for Transparent Substrates
FromEumetrys
YPI-MX-DC model detects on transparent substrates, contamination of particles up to 0.1µm. Working on wafers from 2 to 8 inches, it can inspect materials such as SiC and GaN. Its laser of 355nm of wavelength eases analysis on compound semiconductor industry substrates. For the most exotic applications, it is possible to double the number of optical heads. It is also possible to add a second detector channel which improves measurement accuracy.
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This product is ideal for following applications:
- Process control
- Contamination control of wafers, including Epi on SiC and thin layers
- Equipment contamination control
- Polishing process control
- Wafer reception control, coming from your suppliers
Two types of scan are available: helical or raster (XY). XY sweep allows to work on wafers and square substrates, the helical being for wafers only.
