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Photonic Science - Vertical Laue Crystal Orientation System
Available in 3 configurations – Vertical, Horizontal, and Grain Map – the Photonic Science back reflection Laue system allows real-time crystal orientation down to 0.1 degrees accuracy. Single crystal electro-optical properties are strongly dependent on crystallographic orientations. The Laue tool collects high-resolution X-ray diffraction patterns from a single crystal, allowing the right crystallographic plane to be selected with excellent accuracy.
Single-crystal materials are playing an important role in novel devices, from non-linear optics to jet engine turbine blades and superconducting materials. A high-resolution Crystal Orientation System is the ideal tool to capture and analyse the Laue diffraction pattern from a wide range of crystalline materials.
With dedicated software, the orientation of single crystals can be measured quickly with excellent accuracy
The system delivers an intense X-ray beam with less than 0.3mm on the sample. Single crystals` electro-optical properties are strongly dependent on crystallographic orientations.
The LAUE tool collects a high-resolution X-ray diffraction pattern from the single crystal out of which the right crystallographic plane cut can be selected with excellent accuracy.
- Available in Vertical, Horizontal, and Grain Map configurations
- Plug-n-Play compact cabinet system - no customised bench or additional services required
- Fully automated and motorised XYZ Stages and Goniometer, with manual options available
- CCD back reflection, high-resolution, high-sensitivity x-ray detector
- Proprietary focussing optics giving a small collimated beam size
- Fast and precise alignment of small crystals with on-board high-resolution viewing camera
- Distance measurement tool for precise and reproducible sample positioning
- Dedicated Laue Software for full control, data acquisition, processing and analysis
- High-throughput sample screening options
The most flexible configuration, the Vertical Laue system uses a vertical beam path for high throughput scanning of multiple crystals in isolation or multiple areas of interest. Using gravity, samples do not need to be adhered to the platform, allowing for easier mounting, and orienting of crystals. With a <200µm beam size both sub-millimetric range samples and larger components like turbine alloys are accommodated.
The Laue System is also available with a traditional horizontal geometry. A horizontal Laue System is well suited to orient the crystal for cutting or to quickly scan the crystal to identify reflections.
A vertical system featuring a special camera, lens, illumination, and mapping software to measure the orientation of each grain. Grain Map includes a fully motorised XYZ Stage and Goniometer as standard, and is ideal for grain mapping silicon wafers.
Crystal Growth
Real Time Crystal Orientation
Crystal Characterisation
Crystal Cutting
Photovoltaic Inspection
Two-Dimensional orientation mapping of polycrystalling silicon wafers
Semiconductor Crystals
Wafer Inspection
Automatically detects diffraction spots and calculates spot position against reference crystal
Automatically calculates mis orientation against goniometer and crystallographic axis (no manual fit or distorted patterns)
Intuitive workflow for multiuser operation and non-expert crystallography users
Saves angular measurements in CSV format for Quality Assurance traceability
Built-in Macro interface for automating repetitive routines
Compatible with CFL data files
Remote access control for ongoing service support, minimising downtime
