Particle Measuring Systems (PMS)

PMS Chem 2020 nm Chemical Particle Counter

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Leading-edge microelectronic processes require very clean process chemicals that are highly filtered and regulated to a particle size of 20 nm or below. With 20 nm particle sensitivity, the new PMS Chem 20 Chemical Particle Counter is the world’s most sensitive particle sensor for high purity process chemicals. Extensive data on chemical distribution and packaging systems proves that the PMS Chem 20 sensor, with 20 nm sensitivity, detects larger concentrations of particles with better statistics than competitive products. The Chem 20 Chemical Particle Counter is a valuable tool that enables facility and process engineers to quickly detect and characterize chemical particle sources before they impact process and device performance.

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Prevent process failures and poor device performance with the Chem 20™ chemical particle counter.

  • Respond quickly to chemical changes
  • Reduce uncertainty with improved accuracy and reliability
  • Meet the International Roadmap for Devices and Systems (IRDS)
Increase yield and reduce defects or product recalls by preventing process contamination. The Chem 20™ offers online and batch sample-based chemical monitoring from incoming QC to point of use.

20 nm Sensitivity

Reduce shutdown risks with earlier warnings of smaller changes and contamination. Also, lower downtime and investigations by decreasing false positive. This monitor overcomes background noise, increasing reliability of particle measurements.

Obtain Stable and Repeatable Data

Confidently control your processes while ensuring quality assurance with stable and repeatable data.

Laser Safety and Leak Detection

Protects equipment, people and samples with leak detection alarms.

Sensing Bubbles and Handling Flow Reduction

Stop estimating particle concentrations. The Chem 20™ senses bubbles and reductions in sample flow to ensure accurate and reliable monitoring of samples for data integrity.

  • Detect 20 nm PSL and 9 nm Au particles in real time
  • Detect yield-limiting particles (not possible with competitive technologies)
  • Easy online and offline 20 nm testing
  • React quickly to particle excursions long before surface scan or yield data are available
  • Optimize chemical delivery systems from the loading dock to pointof-process
  • Tighten process control limits through improved sample population statistics
  • Advanced laser optics and detectors enable detection of 20 nm polymer and 9 nm metallic particles in chemicals
  • On-board chemical flow meter to set sample flow
  • First particle counter optimized for low and high refractive index chemicals for improved performance:
    • Chem 20 sensor, for chemicals with lower indices of refraction
    • Chem 20-HI sensor, tailored for sulfuric acid and other higherindex chemicals
  • On-board leak detection to provide alarm upon an internal chemical leak
  • Low-flow detector and alarm to ensure consistent data
  • Bubble detector to optimize data and protect sensor
  • Syringe sampling with the SLS-20 syringe liquid sampler
  • Two view modes optimize instrument operation for very dirty or very clean applications, extending product application space
  • Local data display
  • Flexible communications systems support legacy data acquisition systems
  • Real-time particle monitoring within chemical distribution systems
  • Point-of-process monitoring
  • Chemical packaging operations monitoring
  • Chemical filter performance and efficiency characterization
  • Chemical QA and verification
  • Performance testing of chemical handling components