Peschl - Model MPDSEVO -Process Development System for AOP
It is a known fact that no two wasrewaers are of the same composition. The photochemical treatment of wastewater in the industrial sector requires detailed pre-investigation in the laboratory, where the various photochemical processes for wastewater cleaning can be compared and the relevant process parameters established. Without exception, this procedure must be carried out in every single case.
Photoreactor requirements for „Advanced Oxidation Processes“ (AOPs) vary according to the photochemical process used and demand that the reactor can adapt to the prevailing circumstances to enable the process development to take place and produce the optimum results.
The MPDSEVO - AOP Photoreactor has resulted from years of experience and the expert knowledged built up over these years in dozens of specialist UV applications and now defines toaday`s ste-of-the-art technology.The result of this meticulous development work is a patented, completely new reactor design with otstanding properties. This allows the simple, structured and reproducible development of photochemical reactors for treating wastewaters with the highest precision.
The vertical, annular photo reactor of boron silicate glass, is fitted with a synthetic quarz glass sheathing tube, which has a high transmission <200nm. this sheathing tube is replaceable and is available in different diameters so that the ideal optical path length can be set as required. According to the process used, different radiation sources from the VUV to the visible spectrum can be used. THe use of the unique easy-opscaling radiation sources allows anaalysis of the energy demand and so allows the first rough cost estimate (CAPEX / OPEX).
As the sheathing tube can be made inert, this eliminates the formation of ozone and any resultant absorption The educt is flowed in tangentially and at the relevant volumetric flow, this creates an optimal, abrasive rorational flow, which efficiently minimises any coating formation by polymerisation effects. Optionally, the reactor can be run with external cooling, but in this case the reactor must be thermally stabilised. H2O2 can be continuously injected into the photo reactor Gases and liquids can be added at any point in the reaction to maintain a stable concentration of oxygen and peroxide in the reaction zone.
If required, the photo reactor can be supplied metal-free and absolutely corrosion-resistant. In such a reactor, various synthetic reactions can be carried out, as well as TOC depletion in the field of ultra pure water for the semi-conductor industry. The photo reactor is easily dismantled for cleaning or it can be cleaned within a CIP (Cleaning in Place) regime.
For the first time, with the AOP photoreactor it is possible to compare all the different photochemical AOP processes and obtain the relevant laboratory results to enable you to select an optimum industrial plant from the Peschl Ultraviolet GnbH portfolio and treat the target volume flow most efficiently.