Rigaku - Model XHEMIS TX-2000 -Next-generation Total Reflection X-ray Fluorescence System
The XHEMIS TX-2000 is the successor to Rigaku’s proven TXRF 3760, redesigned to meet the latest SEMI, EMC, and UL standards while introducing advanced automation, digital control, and machine-learning capabilities. Building on more than two decades of field-proven reliability, the TX-2000 delivers higher safety, stability, and analytical performance for contamination control in modern semiconductor fabs. With transparent-wafer compatibility, an integrated FFU for clean wafer transfer, and fully digitalized utilities, it extends the legacy of the TXRF 3760 into a smarter, more robust platform for next-generation Si, SiC, and GaN manufacturing environments.
The Rigaku XHEMIS TX-2000 represents the evolution of the industry-proven TXRF 3760 platform, engineered to meet the latest SEMI, EMC, and UL safety standards while enhancing throughput, automation, and data intelligence.
Designed for 200 mm wafer fabs, TX-2000 delivers in-line, non-destructive quantification of ultra-trace metallic contaminants on wafer surfaces, empowering fabs to achieve tighter process control and yield optimization across SiC, GaN, and Si device manufacturing.
With integrated safety PLC monitoring, improved ergonomics, digitalized utilities, and optional machine-learning spectral prediction, the TX-2000 ensures robust fab operation with minimal downtime and maximum operator confidence.
Compliance with International Safety Standards
Conforms to SEMI S2-0821, S8-0218, S14-1016, EN 60204-1:2018 (NFPA 79:2018), UL 508A 3rd
Machine-Learning Spectral Prediction (Option)
Reduces measurement time by predicting spectral profiles from process recipes
Dual Interlock System
Dual interlock system and added cassette door for physical isolation from moving parts
Transparent Substrate Compatibility
Supports glass, sapphire, and other transparent wafers through advanced Ori-flat notch search sensor
Safety PLC
Monitors EMO buttons, power, exterior panels, vacuum switches, and cassette doors
Presence and Size Detection
Prevents mis-operation and enables smooth automation integration
IP22/IP42 Compliant
IP22 / IP42 enclosure prevents ingress of particulates and liquids
FFU Standard Configuration
Eliminates need for external FFU in SMIF use; minimizes particle contamination during wafer transfer
SEMI F47-Compliant Power Rack
Ensures stable performance during voltage fluctuations
- Technique : Total reflection X-ray fluorescence (TXRF)
- Measurement items : Ultratrace metal contaminants on wafer surfaces
- Sample compatibility : Si, SiC, GaN, glass, sapphire; up to 200 mm wafers
- Compliance : SEMI S2-0821 / S8-0218 / S14-1016 / EN 60204-1:2018 / UL 508A 3rd / SEMI F47
- Footprint : Approx. 1050 mm H × 1025 mm W × 229 mm D (compact fab-fit design)
- Power : 200 V AC (DC24 V control system)