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  5. Plasma-Therm - Model Heatpulse - RTP ...

Plasma-Therm - Model Heatpulse -RTP System

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The Heatpulse RTP System is an advanced rapid thermal processing solution designed for a wide range of semiconductor applications. This system is capable of processing various materials, including silicon, silicon carbide (SiC), gallium arsenide (GaAs), gallium nitride (GaN), quartz, and sapphire. Such versatility makes it suitable for diverse substrate sizes and types. The Heatpulse RTP operates within a single-wafer chamber, rapidly heating wafers and maintaining precise temperature control through closed-loop systems. This technology is extensively used in semiconductor processes such as post-implant annealing, oxide and nitride film growth, reflow, and the formation of silicides, salicides, and metal alloys. The system is supported by the Cortex® control system, which offers a stable and user-friendly interface, boosting efficiency and productivity. Plasma-Therm also provides support and upgrades for legacy systems like the AG Heatpulse 8108 and 8800.
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Rapid thermal processing (RTP) can be used in a multitude of semiconductor process steps, such as post-implant annealing, growth of oxide and nitride films, reflow, and formation of silicides, salicides, and metal alloys. In a single-wafer chamber, wafers are rapidly heated and held at a closed-loop controlled temperature. The Heatpulse RTP system can process a variety of substrates, such as silicon, silicon carbide (SiC), gallium arsenide (GaAs), gallium nitride (GaN), quartz, and sapphire.

AG Heatpulse Legacy Systems

We support the legacy AG Heatpulse 8108 and 8800 systems with spare parts, field service, and upgrades.

Process: 

  • Annealing
  • Reflow
  • Activation
  • Ohmic formation
  • Oxidation
  • Silicides and salicides

Hardware:

  • Accommodates substrates up to 200mm
  • Single or twin oven configurations
  • Atmospheric front end
  • O2 analyzer
  • Independent, multi-zone heater function
  • Up to 1200C
  • Pyrometry temperature measurement

Control System:

  • Graphical, SEMI-standard (E-95) interface
  • Comprehensive recipe editing and process parameter data logging and charting (real-time and post-processing)
  • Automated clean and conditioning routines with configurable triggers
  • Factory automation host interface (with optional SECS/GEM license)
  • User-level access control 
  • Auto logging of alarms, jobs, calibration, and resource usage
  • Integrated with GLANCE™ data logging and visualization tool
  • Same feature-rich control system as used on high-volume production systems